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Health & Science1h 49m ago
Researchers have discovered that pretreating molybdenum disulfide with oxygen or fluorine can make it easier to remove the top sulfur layer of ultrathin materials used in next-generation transistors without damaging the underlying layers.
Princeton, New Jersey, USA
Who
Yury Polyachenko, Princeton University, U.S. Department of Energy's (DOE) Princeton Plasma Physics Laboratory (PPPL)
What
Researchers have discovered that pretreating molybdenum disulfide with oxygen or fluorine can make it easier to remove the top sulfur layer of ultrathin materials used in next-generation transistors without damaging the underlying layers.
When
Tue, 16 Jun 2026 17:20:06 GMT · 1h 49m ago
Where
Princeton, New Jersey, USA ·
Why
This discovery aims to make the manufacturing process of smaller, more capable next-generation computer chips easier and more precise.
The Frontline Impact
How this affects you
This research outlines a method to improve the manufacturing of advanced computer chips, potentially leading to more powerful and efficient electronic devices in the future. The findings offer a pathway to overcome a significant challenge in combining new materials with silicon for smaller transistors.
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